Wet Process Filter Cartridge
Wet Process filter cartridge is belong to pleated filter cartridge. Wet process filter cartridge is composed of PTFE membrane and PFA cage, with high flow rate and excellent chemical compatibility. Each filter cartridge is cleaned with 18 MΩ ultra-pure water to ensure the filter cartridge cleanliness.
- Filter media: PTFE
- Inner core: PFA
- Out core: PFA
- O-ring: FEP
- Flow Rate
- 500 GPM
- Micron Rating
- 5, 10, 25 μm
- Max Temperature
- up to 80°C
- 100% integrity tested and rinsed with 18 MΩ ultrapure water
- All-fluoropolymer construction resists virtually all chemicals and gases
- Operates in very high temperature environments
- Unique structure provides high dirt-holding capacity and high flow rate
The wet process filter cartridge belongs to the pleated filter cartridge family. It pairs a PTFE membrane with a PFA cage, delivering high flow rate and excellent chemical compatibility.
The goal of the wet process is to remove fine dust, metal ions, native oxide, and organic residues from the wafer using a chemical solution — without damaging wafer surfaces or electrical properties.
The chemical reagents used in these processes are critical wet-process materials in the electronics industry. Because impurity-content limits are extremely strict, filtration is essential.
To resist these highly corrosive reagents, we build the cartridge from corrosion-resistant PFA and PTFE. These materials keep the cartridge intact during service, while the nano-scale high-precision membrane delivers the required filtration accuracy.
Every cartridge is produced in a clean workshop and 100% integrity tested, meeting the high-cleanliness standards required for semiconductor applications. Raw materials and in-process storage are all managed under an ISO 9001 quality management system.