عنصر المرشح الضوئي
Pullner’s photoresist filter element uses a natural hydrophilic nylon 6,6 membrane with HDPE support and end caps, engineered to filter photoresist and developer in semiconductor and electronics manufacturing. Its low differential pressure, fast start-up, and minimal bubble generation reduce photochemical waste and improve process yield.
- معدل التدفق
- 500 جالون في الدقيقة
- تصنيف الميكرون
- 5، 10، 25 ميكرومتر
- درجة الحرارة القصوى
- حتى 80 درجة مئوية
| الغشاء | Hydrophilic Nylon 6,6 |
| Core, Cage, End Caps | High Density Polyethylene (HDPE) |
| O-ring Options | Viton, EPR |
| Removal Ratings | 20nm, 40nm, 0.1 micron, 0.2 micron |
| Wettability | Spontaneous (no pre-wetting required) |
| الشهادات | آيزو 9001 |
Natural hydrophilic nylon 6,6 wets spontaneously on contact with aqueous photoresist and developer without any pre-wetting step, which eliminates the startup bubbles that cause coating non-uniformity and yield loss in photolithography. The quick-vent design allows any residual gas to escape immediately, so the element reaches full flow from the first cycle. All hardware (core, cage, end caps, support, and drainage layers) is HDPE, minimising metallic extractables that could contaminate sensitive photochemical fluids.