Photoresist Filter Element

The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light.

A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.

In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.

Photoresist filters are specially designed to filter dots of photoresist and developer. Natural hydrophilic nylon 6,6 membrane, HDPE support and hardware, allowing spontaneous wettability.

This minimizes photochemical waste by providing fast start-up, minimal bubble generation and consistent performance. The special discount structure guarantees a low pressure drop.

A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.